ST3000 ST55 XIAD
Mini-Gun Ion Current Monitor Sheet Resistance Monitor

 

 

ST3000

The SainTech ST3000 Ion System has been specially developed to provide an extremely reliable and maintenance-free facility for many applications in physical vapour deposition processes. The compact design and rugged construction allows easy installation to both new and existing vacuum deposition systems.

 

ST3000 Features:

  • Ion Beam energies up to 300eV
  • Ion Beam power to 3.0 kilowatts
  • Ion Beam currents to 15 amps
  • Full-time use of high purity oxygen

 

Optional Features Available –

  • Dual Filament. Electronic system detects filament failure and auto switches to second filament. Refer System Specifications for detail
  • Dual Gas. This feature provides use of either pure gas delivery or a mixture of two gases in any ratio. Refer System Specification for detail
  • Mounting Hardware MH. Several options are available. The mounting brackets are clamped to a special gas feedthrough. Refer System Specification for detail

 

Dimensions Source diameter 115 mm diameter by 80 mm long (4.5” x 3.2”)
Source weight – 4 kgs (approx. 9 lbs)
Beam power Anode volts selectable to 300 volts; anode power 3000 W
Beam current to maximum 12 amps under manual or automatic beam control
Beam divergence Wide beam divergence in excess of 80 degrees
Gas flow Approximately 12sccm gas flow required to produce 4 amps (typical)
Cooling water minimum 4.0 liters/minute. Water flow is constantly monitored
Power Unit weight approx. 35 kgs (72lbs) 175mm x 435mm x 520mm
Power Needs 208 – 250 VAC single phase 50 or 60Hz 15 amps
MFC supplied range 30 sccm

 


ST55

The SainTech ST55 Ion System has been specially developed to provide a cost effective solution for ion-based vacuum processes for medium to large sized deposition systems. The ST55 provides an extremely reliable and maintenance-free facility for many applications in PVD processes. The compact design and rugged construction allows easy installation to both new and existing vacuum deposition systems.

 

ST55 Features:

  • Ion beam energies up to 230eV
  • Ion Beam power to 1.5 kilowatts
  • Ion Beam currents to 7 amps 
  • Full-time use of high purity oxygen. 
  • Special Coiled Filaments provide lifetimes up to 12 hours in pure oxygen

 

Optional Features Available:

  • Dual Filament DF. Electronic system detects filament failure and auto switches to second filament. Refer System Specifications for detail
  • Dual Gas DG. This feature provides use of either pure gas delivery or a mixture of two gases in any ratio. Refer System Specification for detail.
  • Mounting Hardware MH. Several options are available. The mounting brackets are clamped to a special gas feedthrough. Refer System Specification for detail

 

Dimensions Source diameter 75 mm diameter by 70 mm long (3” x 2.75”)
Source weight – 1.4 kgs (approx. 3 lbs)
Beam power Anode volts selectable to 225 volts; anode power 1500 W
Beam current to maximum 7 amps under manual or automatic beam control
Beam divergence Wide beam divergence in excess of 80 degrees
Gas flow Approximately 8sccm gas flow required to produce 2 amps (typical)
Cooling water minimum 2.5 liters/minute. Water flow is constantly monitored
Power Unit weight approx. 30 kgs (66lbs) 175mm x 430mm x 460mm
Power Needs 208 – 250 VAC single phase 50 or 60Hz; 10 amps

 

 

 

XIAD

The SainTech XIAD Ion System has been specially developed  to provide a cost effective solution for ion-based vacuum processes for small to medium sized deposition systems. The XIAD provides an extremely reliable and maintenance-free facility for many applications in PVD processes. The compact design and rugged construction allows easy installation to both new and existing vacuum deposition systems.

 

XIAD Features:

  • Ion beam energies up to 230eV
  • Ion Beam power to 1.0 kilowatts
  • Beam currents to 5 amps
  • Full-time use of high purity oxygen.
  • Special Coiled Filaments provide lifetimes up to 12 hours in pure oxygen

 

Options Available:

  • Dual Gas DG. Option provides facility to deliver either of two installed gases in either pure gas or specified gas mix ratio. Gas mixture is set from the touch screen.
  • Mounting Hardware MH. Several options are available. The mounting brackets are clamped to a special gas feedthrough


Complete Series III XIAD package includes:

  • XIAD Ion Source
  • XIAD Series III Power supply - 200 -250 VAC, single phase 50 or 60Hz; 10 amps
  • Gas flow controller supplied 25 sccm (oxygen)
  • Operational, maintenance and service manual
  • All feedthroughs – gas, electrical & water

 

Dimensions Source diameter 60 mm diameter by 60 mm long (2.5” x 2.5”)
Source weight – 1.2 kgs (approx. 2.5 lbs)
Beam power Anode volts selectable to 225 volts; anode power 1000 W
Beam current to maximum 5 amps under manual or automatic beam control
Beam divergence Wide beam divergence in excess of 80 degrees
Gas flow Approximately 6sccm gas flow required to produce 2 amps (typical)
Cooling water minimum 2.0 liters/minute. Water flow is constantly monitored
Power Unit weight approx. 28 kgs (60lbs) 175mm x 430mm x 460mm 
Power Needs 208 – 250 VAC, single phase 50 or 60Hz 10 amps

 

Mini-Gun

Designed as the ultimate IAD ion source for PVD processes in small chambers with minimal pumping speed

 

Designed for installation to chambers with very small pumping speed – as low as 200 litres per second

  • Requires only 3 sccm of gas flow to produce 1 amp of beam current.
  • Can be completely mounted from one 63 CF flange
  • Small physical size – head measures only 50mm diameter
  • Produces up to 200μA/cm2 at a work distance of 150mm
  • Very low maintenance – supplied with Patented TiN coated anode for ease of cleaning and stable operation
  • Dual gas option available – oxygen or argon available by Touch Screen selection.
  • Bakeable to 300ºC

 

Optional Features Available:

  • Dual Gas DG. This feature provides use of either pure gas delivery or a mixture of two gases in any ratio. Refer System Specification for detail.
  • Mounting Hardware MH. Several options are available. The mounting brackets are clamped to a special gas feedthrough. Refer System Specification for detail
  • Beam Profile Enhancer. The standard wide angle beam distribution can be modified to deliver a considerably narrower beam profile with no degradation of ion generating performance. Refer System Specification for detail.

 

Dimensions Source diameter 50 mm diameter by 60 mm long
Source weight – 0.5 kgs (1.0 lbs)
Beam power Anode volts set selectable between 90 to 225 volts
Beam current to 4 amps maximum 
Beam divergence Wide beam divergence in excess of 60 degrees – Standard Format.
Gas flow Gas flow controlled Mass Flow Controller. Typical flow 3-5 sccm 
Cooling water minimum 1.5 liters/minute 
Power Unit Approx. 20 kgs (44 lbs). Dimensions; 175mm x 430mm x 460mm 
Power Needs 208 – 250 VAC, single phase 50 or 60Hz; 10 amps

 

 

Ion Current Monitor

The Saintech Ion Current Monitor (ICM) provides REAL TIME Monitoring of Ion Flux throughout Ion-based Deposition Processes

 US Patent Nos. 6645301, 6734434 and 6849854 apply - Other patents Pending 

The Ion Current Monitor has been developed to provide essential deposition information for any ion-based process. The ICM monitors the flux of positive ions and outputs the beam current in units of amps per square centimetre. Three amplifier ranges are provided to adequately cover the flux density output from a wide range of commercially available ion beam systems. An adjustable bias voltage is provided to reject negatively charged particles (electrons).

 

ICM Features 

Auto-ranging of the Output Signal

Three auto-ranging ion current ranges provided:

10µA/volt - 100µA/volt - 1000µA/volt

 

The output signal is displayed in any of the following formats:

  • A front panel Digital LCD panel displays the RMS digital ion current signal complete with appropriate units of either microamps or milliamps
  • A bar graph display provides visual representation of the RMS ion current signal
  • The digital RMS signal is available through a connector on the rear panel. The signal can be viewed on a remote voltmeter or signal logging facility.
  • The real-time AC signal can also be output to a cathode-ray oscilloscope (CRO) using a front-panel BNC socket

The Sensor Head.

The sensor head incorporates a revolutionary patented design that allows for the continuous monitoring of the ion beam flux even during the evaporation of dielectric materials.

The sensor head is designed to be ultra-low maintenance and is constructed from materials to be compatible with UHV applications. The head is designed to operate at temperatures compatible with deposition processes to a max. 350°C

 

 

Sheet Resistance Monitor

The Saintech Sheet Resistance Monitor (SRM-150) provides in-situ Real Time monitoring of the  sheet resistance of electrically conducting films

US Patents Pending 

The Sheet Resistance Monitor Model   SRM-150 has been developed to provide valuable information on the electrical properties of thin electrically conducting films. The SRM-150 is designed to accurately measure the sheet resistance of electrically conducting thin films in real time.

The device uses a sensor head mounted in-situ within the deposition chamber and strategically located to sample the vapor stream. The device uses the 4-point probe technique to accureately determine the sheet resistance of the depositing film material.

  

Features of the SRM-150 

 

  • 4-point probe method of measurement
  • 6 decades of resistance measurement 200kΩ down to 200 milliohms
  • Auto-ranging throughout the entire resistance range
  • Accuracy of measurement 0.5%
  • Data from the Electronics Module is relayed to a Digital Display Unit or alternately logged to a computer using a special program (optional)
  • An Embedded Thermocouple monitors the temperature of the substrate during film growth. The sheet resistance can be normalized to room temperature using the (optional) computer program

 

 

The Sensor Head.

The sensor head incorporates a unique electrode design that uses a replaceable Sensor Element. The sensor element is inserted into a slot provided in the sensor head. Once coated, the sensor element requires replacement. The coated sensor element however, can be used for post-deposition measurements and archiving for quality control purposes.

 

Construction of the Sensor Head

The sensor head is designed to be ultra-low maintenance and is constructed from materials compatible with UHV applications. The sensor head is manufactured from non-magnetic stainless steel and contains four sets of gold-plated spring contacts for maintaining low contact impedances to the sensor elements.
In the standard format, the head can safely operate at temperatures to a max. 150°C

 

Applications of the SRM-150

The SRM-150 provides real-time monitoring of any electrically conducting films such as metal films (Ti, Cr, Ag, Au, etc) transparent electrically conducting films (ITO, etc) – see examples below

 

 

 

 

Film Process Studies

Very few thin films behave in an ideal way! The properties of films will often change following deposition and upon venting to air. The data below shows the change in sheet resistance that occurs as a result of venting. Post deposition studies will never show these permanent effects.

 

 

Thermal Properties of Metal Films

The thermal properties of films can be studied either under vacuum conditions or at atmosphere. The data shown in the plot opposite shows the effect on the sheet resistance through a temperature heating and cooling cycle. It is generally observed that the properties of thin metal films seldom behave as bulk materials