ST3000 Ion Beam System for Physical Vapor Deposition processes

The Saintech ST3000 Ion System has been specially developed for high power applications such as large deposition facilities. The ST3000 is an extremely reliable and maintenance-free facility for many applications in physical vapour deposition processes. The compact design and rugged construction allows easy installation to both new and existing vacuum deposition systems.

ST3000 Features:

• Ion beam energies up to 300eV.
• Ion beam currents to 13 amps max.
• Full-time use of high purity oxygen.
• Highly efficient design greatly reduces gas load.
• Water-cooled to reduce maintenance and radiation load and allow immediate venting of chamber upon completion of deposition.
• Extremely low maintenance. The patented design utilizes a specially coated anode, which resists build-up of electrically insulating oxide coatings.
• Extremely stable operation in IAD processes due to patented electrode design.
• Broad - beam divergence for large area coverage with a uniform ion flux.
• Pulse-mode operation for ion-assistance of radiation-sensitive film materials such as many commonly used infrared and UV thin film materials eg MgF2 & LaF2. For further information please refer to separate information sheets.
• Remote Control - a front panel switch toggles control from local operator to remote master control and monitoring of all operational parameters.

Optional Features Available - Dual Gas. Switch between gases, or mix your gases in any desired ratio

Dual Filament. Electronic system detects filament failure and auto switches to second filament.

Click here for full ST-3000 specification and applications sheets, or Contact Us