Introducing the ST55 ion source system for Physical Vapor Deposition processes

The SainTech ST55 Ion System has been specially developed to provide a cost effective solution for ion-based vacuum processes for small to medium sized deposition systems. The ST55 provides an extremely reliable and maintenance-free facility for many applications in physical vapour deposition processes. The compact design and rugged construction allows easy installation to both new and existing vacuum deposition systems.

The ST55 and Ion Assisted Deposition The IAD of thin film growth is a proven technique that provides dense and highly stable films without need of additional substrate heating. The ST55 has further enhanced the IAD process to include deposition onto a wide variety of glasses, plastics and metals. The ST55 provides unparalleled film adhesion for both metal and non-metal films.

ST55 Features:

• Ion beam energies up to 200eV.
• Beam currents to max of 6 amps.
• Full-time use of high purity oxygen.
• Highly efficient gas injection design greatly reduces gas load.
• Direct water-cooling to reduce maintenance and radiation load and allow immediate venting of chamber upon completion of deposition.
• Extremely low maintenance. The patented design utilizes a specially coated anode, which resists build-up of electrically insulating oxide coatings.
• Extremely stable operation in IAD processes due to patented electrode design.
• Broad - beam divergence for large area coverage with a uniform ion flux.
• Pulse-mode Operation for ion-assistance of radiation-sensitive film materials such as many commonly used infrared and UV thin film materials eg MgF2 & LaF2. For further information please refer to separate information sheets.
• Remote Control & Monitoring of process parameters. A front panel control toggles control from local operator to remote master control and monitoring of all operational parameters.

Click here for full ST55 specification and here for applications sheets, or Contact Us